Contents
Russian Microelectronics
Vol. 31, No. 6, 2002
Simultaneous English language translation of the journal is available from MAIK Nauka / Interperiodica (Russia).
Distributed worldwide by Kluwer Academic / Plenum Publishers. Russian Microelectronics ISSN 1063-7397.
Process Technologies
Helicon Plasma Source
O. V. Braginskii, A. N. Vasileva, and A. S. Kovalev p. 341 abstract
X-ray and UV Adjustment of Threshold Voltage
in MOS-Circuit Manufacture
M. N. Levin, V. R. Gitlin, A. V. Tatarintsev,
S. S. Ostrouhov, and S. G. Kadmensky p. 346 abstract
Microelectronic Devices
Mid- and Long-Wave IR Detectors Using an Hg1  xCdxTe Heteroepitaxial Layer
V. V. Vasilyev, A. G. Golenkov, S. A. Dvoretsky, D. G. Esaev,
T. I. Zakharyash, A. G. Klimenko, A. I. Kozlov, I. V. Marchishin,
V. N. Ovsyuk, V. P. Reva, Yu. G. Sidorov, F. F. Sizov,
A. O. Suslyakov, and N. Kh. Talipov p. 351 abstract
Microelectromechanical System for Controlling
Flow Past an Airfoil: Pressure Transducers
A. A. Taskin, B. I. Fomin, E. I. Cherepov, V. A. Gridchin,
V. M. Lubimsky, S. P. Khabarov, G. R. Grek, A. V. Dovgal, and V. V. Kozlov p. 359 abstract
Modeling and Simulation
Modeling the High-Voltage Gas-Discharge-Plasma Etching of SiO2
V. A. Kolpakov p. 366 abstract
Predicting the Effect of Pulsed Ionizing Radiation on Operational Amplifiers
T. M. Agakhanyan and A. Y. Nikiforov p. 375 abstract
Non-Archimedean Calculus in the Mathematical Modeling of Digital ICs
E. G. Shcheglov and P. A. Arutyunov p. 384 abstract
Quality Control
Digital-Reflectometry Characterization of the Surface Structure and Protective Property of Thin Films
V. A. Kotenev p. 396 abstract
Author Index to Volume 31, 2002 p. 407
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