Contents
Russian Microelectronics


Vol. 31, No. 6, 2002

Simultaneous English language translation of the journal is available from MAIK “Nauka / Interperiodica” (Russia).
Distributed worldwide by Kluwer Academic / Plenum Publishers. Russian Microelectronics ISSN 1063-7397.


Process Technologies

Helicon Plasma Source

O. V. Braginskii, A. N. Vasil’eva, and A. S. Kovalev p. 341  abstract

X-ray and UV Adjustment of Threshold Voltage
in MOS-Circuit Manufacture

M. N. Levin, V. R. Gitlin, A. V. Tatarintsev,
S. S. Ostrouhov, and S. G. Kadmensky
p. 346  abstract


Microelectronic Devices

Mid- and Long-Wave IR Detectors Using an Hg1 – xCdxTe Heteroepitaxial Layer

V. V. Vasilyev, A. G. Golenkov, S. A. Dvoretsky, D. G. Esaev,
T. I. Zakhar’yash, A. G. Klimenko, A. I. Kozlov, I. V. Marchishin,
V. N. Ovsyuk, V. P. Reva, Yu. G. Sidorov, F. F. Sizov,
A. O. Suslyakov, and N. Kh. Talipov
p. 351  abstract

Microelectromechanical System for Controlling
Flow Past an Airfoil: Pressure Transducers

A. A. Taskin, B. I. Fomin, E. I. Cherepov, V. A. Gridchin,
V. M. Lubimsky, S. P. Khabarov, G. R. Grek, A. V. Dovgal’, and V. V. Kozlov
p. 359  abstract


Modeling and Simulation

Modeling the High-Voltage Gas-Discharge-Plasma Etching of SiO2

V. A. Kolpakov p. 366  abstract

Predicting the Effect of Pulsed Ionizing Radiation on Operational Amplifiers

T. M. Agakhanyan and A. Y. Nikiforov p. 375  abstract

Non-Archimedean Calculus in the Mathematical Modeling of Digital ICs

E. G. Shcheglov and P. A. Arutyunov p. 384  abstract


Quality Control

Digital-Reflectometry Characterization of the Surface Structure and Protective Property of Thin Films

V. A. Kotenev p. 396  abstract


Author Index to Volume 31, 2002 p. 407


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