Contents
Russian Microelectronics

Vol. 31, No. 6, 2002

Simultaneous English language translation of the journal is available from MAIK “Nauka / Interperiodica” (Russia).
Distributed worldwide by Kluwer Academic / Plenum Publishers. Russian Microelectronics ISSN 1063-7397.

Process Technologies

Helicon Plasma Source

O. V. Braginskii, A. N. Vasil’eva, and A. S. Kovalev p. 341  abstract

X-ray and UV Adjustment of Threshold Voltage
in MOS-Circuit Manufacture

M. N. Levin, V. R. Gitlin, A. V. Tatarintsev,
S. S. Ostrouhov, and S. G. Kadmensky p. 346  abstract

Microelectronic Devices

Mid- and Long-Wave IR Detectors Using an Hg_1 – xCd_xTe Heteroepitaxial Layer

V. V. Vasilyev, A. G. Golenkov, S. A. Dvoretsky, D. G. Esaev,
T. I. Zakhar’yash, A. G. Klimenko, A. I. Kozlov, I. V. Marchishin,
V. N. Ovsyuk, V. P. Reva, Yu. G. Sidorov, F. F. Sizov,
A. O. Suslyakov, and N. Kh. Talipov p. 351  abstract

Microelectromechanical System for Controlling
Flow Past an Airfoil: Pressure Transducers

A. A. Taskin, B. I. Fomin, E. I. Cherepov, V. A. Gridchin,
V. M. Lubimsky, S. P. Khabarov, G. R. Grek, A. V. Dovgal’, and V. V. Kozlov p. 359  abstract

Modeling and Simulation

Modeling the High-Voltage Gas-Discharge-Plasma Etching of SiO₂

V. A. Kolpakov p. 366  abstract

Predicting the Effect of Pulsed Ionizing Radiation on Operational Amplifiers

T. M. Agakhanyan and A. Y. Nikiforov p. 375  abstract

Non-Archimedean Calculus in the Mathematical Modeling of Digital ICs

E. G. Shcheglov and P. A. Arutyunov p. 384  abstract

Quality Control

Digital-Reflectometry Characterization of the Surface Structure and Protective Property of Thin Films

V. A. Kotenev p. 396  abstract

Author Index to Volume 31, 2002 p. 407

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