Contents
Russian Microelectronics

Vol. 33, No. 5, 2004

Simultaneous English language translation of the journal is available from MAIK “Nauka / Interperiodica” (Russia).
Distributed worldwide by Kluwer Academic / Plenum Publishers. Russian Microelectronics ISSN 1063-7397.

Personalia

In Celebration of Tatevos M. Agakhanyan’s 80th Birthday p. 261

Process Technologies

Deposition of Nanoscale Films with Fractal Topography

I. N. Serov, V. I. Margolin, N. A. Potsar, I. A. Soltovskaya,
V. A. Tupik, and V. S. Fantikov p. 263  abstract

Materials and Processes for VLSI

Borophosphosilicate Glass Films in Silicon Microelectronics,
Part 1: Chemical Vapor Deposition, Composition, and Properties

V. Y. Vasilev p. 271  abstract

Uniformity of Optical Constants in Amorphous Ta₂O₅ Thin Films
as Measured by Spectroscopic Ellipsometry

V. A. Shvets, D. V. Gritsenko, V. Sh. Aliev,
S. I. Chikichev, and S. V. Rykhlitskii p. 285  abstract

Micro- and Nanoelectronic Devices

Controlling Electrical Transport through Bundles of Single-Wall Carbon Nanotubes

I. I. Bobrinetskii, V. K. Nevolin, A. A. Stroganov, and Yu. A. Chaplygin p. 292  abstract

Silicon-Surface Restructuring under Cleaning as a Method for Improving Al/Mo-to-Si
Contact Resistance and Microwave-BJT Parameters

Yu. P. Snitovsky p. 298  abstract

Modeling and Simulation

Numerical Solution of the Thomas–Fermi Equation
for the Centrally Symmetric Atom

N. A. Zaitsev, I. V. Matyushkin, and D. V. Shamonov p. 303  abstract

Electronic Design Automation

Custom Logic: A Toolkit for the Design of VLSI Custom
Control MOS Logic

P. N. Bibilo, I. V. Vasil’kova, S. N. Kardash, N. A. Kirienko,
I. P. Loginova, Ya. A. Novikov, V. I. Romanov, N. R. Toropov,
D. I. Cheremisinov, and L. D. Cheremisinova p. 310  abstract

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