Contents

Russian Microelectronics


Vol. 54, No. 5, 2025


Machining of Silicon Carbide Plates with a Bonded Diamond Tool

V. S. Kondratenko, A. A. Isaev, V. V. Kadomkin, G. M. Biryukov, I. I. Borodynkin, and A. D. Tambovskii p. 443  abstract

On the Influence of Various Oxygen-Containing Gases on the Composition of Trifluoromethane Plasma

A. M. Efremov, E. E. Koryakova, V. B. Betelin, and K.-H. Kwon p. 450  abstract

Precision Reconstruction of Polarization Quantum States under Noisy Measurement Conditions

I. K. Golyshev, N. A. Bogdanova, Yu. I. Bogdanov, and V. F. Lukichev p. 458  abstract

On the Correctness of the Model Description of Plasma Composition in an SF6 + He + O2 Mixture

A. V. Myakonkikh, V. O. Kuzmenko, A. M. Efremov, and K. V. Rudenko p. 467  abstract

Method for Testing the Radiation Resistance of Semiconductor Electronics Materials in an Electron Microscope

V. A. Kiselevskii and A. A. Tatarintsev p. 477  abstract

Deformation of a MEMS Transducer Membrane with a Deposited Stressed Layer

V. V. Amelichev, S. S. Generalov, I. V. Godovitsyn, S. A. Polomoshnov, and M. A. Saurov p. 485  abstract

Complementary Studies of Aluminum Thin Films: Resistivity and Real Structure

A. A. Lomov, M. A. Tarasov, K. D. Shcherbachev, A. A. Tatarintsev, and A. M. Chekushkin p. 494  abstract

Structure and Materials of FinFET Transistors

D. A. Abdullaev, L. M. Kolchina, and R. A. Milovanov p. 506  abstract

Effect of Concentration Precursors of ZnS Thin Films Deposited by SILAR Technique on Glass Substrate

H. Elfarri, L. Znaidi, K. Mahmoudi, and K. Nouneh p. 537  abstract

Performance Analysis of Vertical Embedded Gate-Gate All Around FET with Quantum Confinement Effects

Amit Saini, Vishal Narula, and Sangeeta Mangesh p. 547  abstract

Impact of Various Core Materials on the Behavior of Through-Silicon via (TSV) Inductor in a DC/DC Converter

Katepogu Rajkumar, J. Sneha Latha, Bujjibabu Nannepaga, and G. Umamaheswara Reddy p. 558  abstract

Low-Power Analog Circuit for Learning Vector Quantization-Based Brain Tumor Classification Using CMOS 45 nm Technology

A. Arunkumar Gudivada, Sayedu Khasim Noorbasha, and Sd. K. Muskan p. 565  abstract