Contents
Russian Microelectronics

Vol. 32, No. 4, 2003

Simultaneous English language translation of the journal is available from MAIK “Nauka / Interperiodica” (Russia).
Distributed worldwide by Kluwer Academic / Plenum Publishers. Russian Microelectronics ISSN 1063-7397.

In Memoriam: Dr. Petr A. Arutyunov p. 189

Thin Films: Physics and Technology

Thermally Induced Viscous Flow of Borophosphosilicate-Glass
Thin Films on Stepped Surfaces, Part 2: Generalized Parameters for
ULSI Glass Flow Characterization

V. Y. Vasilev p. 190  abstract

Thermal Oxidation of GaAs and InP in the Presence of Al₂(SO₄)₃

S. S. Lavrushina, I. Ya. Mittova, O. V. Artamonova, and G. O. Vladimirov p. 200  abstract

Phenomenological Model of the Piezoresistive Effect in Polysilicon Films

V. A. Gridchin and V. M. Lubimsky p. 205  abstract

Process Monitoring

Phase Detection Used in the Optical-Emission Monitoring
of SiO₂/Si Plasma Etching

K. V. Rudenko, Ya. N. Sukhanov, and N. I. Bazaev p. 214  abstract

Structural Characterization

XRD Study of Quantum-Well Heterostructures

A. M. Afanas’ev, R. M. Imamov, E. M. Pashaev, S. A. Tikhomirov,
M. A. Chuev, and S. N. Yakunin p. 219  abstract

Nanostructures

Computer Simulation of a Nanoscale Ballistic SOI MOSFET
with a Sub-10-nm Si Layer

V. V. V’yurkov, A. A. Orlikovsky, and A. A. Sidorov p. 224  abstract

Devices and Circuits

Nonlinear Response of a Rectangular
Membrane Sensing Element

V. A. Gridchin, V. M. Lubimsky, and A. V. Shaporin p. 233  abstract

Switch-Level Test-Vector Generation
for CMOS Combinational Logic

A. E. Lyul’kin p. 243  abstract

Materials

Lead-Free Solders in IC Manufacture: A Review

V. V. Zenin, V. N. Belyaev, Yu. E. Segal, and A. A. Kolbenkov p. 247  abstract

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