Contents
Russian Microelectronics

Vol. 32, No. 3, 2003

Simultaneous English language translation of the journal is available from MAIK “Nauka / Interperiodica” (Russia).
Distributed worldwide by Kluwer Academic / Plenum Publishers. Russian Microelectronics ISSN 1063-7397.

Process Technologies

Thermally Induced Viscous Flow of Borophosphosilicate-Glass Thin Films
on Stepped Surfaces, Part 1: A Review of Quantitative Studies on Furnace
and Rapid Thermal Annealing

V. Y. Vasilev p. 125  abstract

Selective Anodizing for Making Multilevel Interconnections

A. I. Vorob’eva, V. A. Sokol, and V. M. Parkun p. 136  abstract

Formation and Properties of an Oxide Film on an Si₃N₄
Surface under Thermal Oxidation

A. E. Ivanchikov, A. M. Kisel’, V. I. Plebanovich,
V. I. Pachynin, and V. E. Borisenko p. 145  abstract

Mechanism of the Ultradeep Anisotropic Chemical Etching
of Si(100) in the Microfabrication of Piezoresistive Pressure Sensors

L. V. Sokolov, S. V. Arkhipov, and V. M. Shkol’nikov p. 151  abstract

Characterization

Al_xGa_{1 – x}As/GaAs/Al_xGa_{1 – x} As Double Quantum Well with a Thin AlAs
Interwell Barrier: Structural Characterization by SIMS and XRD

A. M. Afanas’ev, G. B. Galiev, R. M. Imamov, E. A. Klimov, A. A. Lomov,
V. G. Mokerov, V. V. Saraikin, and M. A. Chuev p. 158  abstract

Quantitative Optical Inspection of Mirror-Like Wafer Surfaces

S. F. Sen’ko, A. S. Sen’ko, V. A. Zelenin, and E. G. Puglachenko p. 165  abstract

Microdevices

Triple-Collector Lateral Bipolar Magnetotransistor:
Response Mechanism and Relative Sensitivity

A. V. Kozlov, M. A. Korolev, S. Yu. Smirnov, Yu. A. Chaplygin, and R. D. Tikhonov p. 172  abstract

Modeling and Testing

Fractal Analysis of Digital Systems: The Structure
and Properties of the Scale Factor

P. A. Arutyunov^† p. 178  abstract

Delay-Conscious Switch-Level Modeling
of MOS LSI Circuits

L. A. Zolotorevich p. 182  abstract

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