Vol. 55, No. 4, 2021
Formation of Semipolar Group-III-nitride Layers on Textured Si(100) Substrates with Self-forming Nanomask
p. 395 abstract
Adsorption of Group-II and -VI Atoms on Silicon-Carbide Polytypes
p. 399 abstract
High-Voltage 4H-SiC-Based Avalanche Diodes with a Negative Bevel
p. 405 abstract
Influence of the Design Features of a Magnetron Sputtering Deposition System on the Electrical and Optical Properties of Indium—Tin Oxide Films
p. 410 abstract
Semiconductor Sensor of the Thermoelectric Single-Photon Detector for Recording Near-Infrared Radiation
p. 415 abstract
Formation of Silicon Nanoclusters in Disproportionation of Silicon Monoxide
p. 423 abstract
Application of Atomic Layer Deposition for the Formation of Nanostructured ITO/Al2O3 Coatings
p. 438 abstract
Current–Voltage, Capacitance–Voltage–Temperature, and DLTS Studies of Ni|6H-SiC Schottky Diode
p. 446 abstract
High-Power CW InGaAs/AlGaAs (1070 nm) Lasers with a Broadened Lateral Waveguide of the Mesa-Stripe Design
p. 455 abstract