Vol. 54, No. 2, 2020
Thermal Conductivity of Cu2ZnGe1 – xSnxSe4 Alloys
p. 159 abstract
Negative Differential Conductivity of Lanthanum-Oxide-Based Structures
p. 163 abstract
Fabrication and Analysis of the Current Transport Mechanism of Ni/n-GaN Schottky Barrier Diodes through Different Models
p. 169 abstract
Profiling Mobility Components near the Heterointerfaces of Thin Silicon Films
p. 176 abstract
Ge/Si Core/Shell Quantum Dots in an Alumina Matrix: Influence of the Annealing Temperature on the Optical Properties
p. 181 abstract
Molecular States of Composite Fermions in Self-Organized InP/GaInP Quantum Dots in Zero Magnetic Field
p. 190 abstract
Influence of Radiation Defects Induced by Low-Energy Protons at a Temperature of 83 K on the Characteristics of Silicon Photoelectric Structures
p. 196 abstract
Structural and Dielectric Study of Thin Amorphous Layers of the Ge–Sb–Te System Prepared by RF Magnetron Sputtering
p. 201 abstract
Dielectric Spectroscopy and Features of the Mechanism of the Semiconductor–Metal Phase Transition in VO2 Films
p. 205 abstract
Effect of Temperature on the Morphology of Planar GaAs Nanowires (Simulation)
p. 212 abstract
Energy-Efficient Gas Sensors Based on Nanocrystalline Indium Oxide
p. 217 abstract
Exactly Solvable Model Problem on a Graphene Nanoribbon with Zigzag Edges
p. 222 abstract
Structural and Photoluminescence Properties of Graphite-Like Carbon Nitride
p. 228 abstract
Model of the Negative-Bias Temperature Instability of p-MOS Transistors
p. 233 abstract
Model of the Effect of the Gate Bias on MOS Structures under Ionizing Radiation
p. 240 abstract
Effect of Temperature on the Characteristics of 4H-SiC UV Photodetectors
p. 246 abstract
Long-Wavelength LEDs in the Atmospheric Transparency Window of 4.6–5.3 μm
p. 253 abstract
Edge-Termination Technique for High-Voltage Mesa-Structure 4H-SiC Devices: Negative Beveling
p. 258 abstract
Comparative Analysis of Injection Microdisk Lasers Based on InGaAsN Quantum Wells and InAs/InGaAs Quantum Dots
p. 263 abstract
Investigation of the Influences of Post-Thermal Annealing on Physical Properties of TiO2 Thin Films Deposited by RF Sputtering
p. 268 abstract