Morphology of Polytetrafluoroethylene Thin Layers
Formed on a Solid Substrate
in Electron-Beam Vapor Deposition Polymerization
1

I. A. Volegova*2, M. A. Bruk*, E. N. Zhikharev**,
N. V. Kozlova*, and Yu. K. Godovsky*

* Karpov Institute of Physical Chemistry,
ul. Vorontsovo pole 10, Moscow, 103064 Russia

** Physicotechnological Institute, Russian Academy of Sciences,
Nakhimovskii pr. 36/1, Moscow, 117218 Russia

Received May 14, 2002;
Revised Manuscript Received September 11, 2002

Abstract—A PTFE layer as a continuous spot ~10 mm in diameter, whose thickness was maximum in its cen-
tral part (~700 nm) and gradually decreased on passing to the periphery, was formed through the electron-beam
vapor deposition polymerization of tetrafluroethylene on a silicon substrate. The structure of the polymer layer
obtained was studied using scanning-force microscopy, electron microscopy, IR spectroscopy, and other tech-
niques. The average degree of polymerization of the polymer produced did not exceed a few tens. It was
assumed that polymer chains are arranged primarily normal to the substrate surface, forming disc- and ribbon-
like mesomorphic entities with a minimal size of ~15 nm. This value corresponds to the length of an oligomeric
PTFE macromolecule with a degree of polymerization of ~30. The original mesomorphic structure of the layer
in question was metastable, as the formation of local crystalline regions takes place after several months storage
at room temperature.


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