Investigation of the Modified Chemical Vapor Deposition
in Preparation of Glasses in the SiO₂GeO₂F System

A. G. Andreev^a, V. S. Ermakov^a, I. I. Kryukov^a, M. K. Tsibinogina^a, A. B. Shein^b,
P. A. Zlobin^c, E. V. Kolobkova^c, and M. A. Eron’yan^d

^a OAO PNPPK, ul. Dvadtsatipyatiletiya Oktyabrya 106, GSP-590 Perm, 614990 Russia

^b Perm State University, ul. Bukireva 15, Perm, 614990 Russia

^c St. Petersburg Technological Institute (Technical University), Moskovskii pr. 26, St. Petersburg, 198013 Russia

^d Federal State Unitary Enterprise, All-Russia Scientific Center “Vavilov State Optical Institute,”
Birzhevaya liniya 12, St. Petersburg, 190034 Russia

e-mail: eronyan@mail.ru

Received February 3, 2006

Abstract—The compositions of fluorogermanosilicate glasses prepared by the modified chemical vapor depo-
sition (MCVD) method are calculated in terms of equilibrium thermodynamics. The calculations are based on
the assumption regarding the formation of a mixture of pure oxide particles. This assumption is confirmed by
the IR transmission spectra of porous deposits.

DOI: 10.1134/S1087659606050051

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