Preparation of Antireflection Coatings from Silicon Dioxide
on Glass and Quartz by the SolGel Method with Oligoethers

B. B. Troitskii^a,*, Yu. A. Mamaev^b, A. A. Babin^b, M. A. Lopatin^a, V. N. Denisova^a,
M. A. Novikova^a, L. V. Khokhlova^a, and T. I. Lopatina^a

^aRazuvaev Institute of Organometallic Chemistry, Russian Academy of Sciences,
ul. Tropinina 49, Nizhnii Novgorod, 603950 Russia

* e-mail: troitski@iomc.ras.ru

^bInstitute of Applied Physics, Russian Academy of Sciences, ul. Ul’yanova 46, Nizhnii Novgorod, 603950 Russia

Received June 22, 2009

Abstract—Antireflection coatings with a low refractive index (1.18–1.23) have been prepared on silicate glass
and optical quartz from mesoporous silicon dioxide synthesized by the sol–gel method in the presence of oli-
goethers. The optimum concentration of the oligoester in the sol is equal to 1.5–2.5 wt %. For the single-layer
double-sided coating, the maximum transmission is equal to 99.0% for the silicate glass and 99.9% for quartz.

Key words: sol–gel process, oligoethers, silicon dioxide, antireflection coating, silicate glass, optical quartz

DOI: 10.1134/S108765961005010X

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