Fabrication of Glasses in the TeO₂WO₃ System Using
Plasma Chemical Oxidation of Tellurium and Tungsten
Chlorides

A. S. Lobanov^a, G. E. Snopatin^a, A. M. Kutyin^a, V. V. Dorofeev^a, V. S. Polyakov^a,
A. I. Suchkov^a, M. F. Churbanov^a, V. G. Plotnichenko^b, V. V. Koltashev^b, and E. M. Dianov^b

^aInstitute of Chemistry of High Purity Substances, Russian Academy of Sciences,
ul. Tropinina 49, Nizhni Novgorod, 603137 Russia

e-mail:lobanov@ihps.nnov.ru

^bFiber Optics Research Center, Russian Academy of Sciences, ul. Vavilova 38, Moscow, 119333 Russia

Received January 17, 2011

Abstract—The possibility of producing tungsten–telluride glasses using plasma chemical vapor phase deposi-
tion using corresponding chlorides as source components has been experimentally demonstrated. Homoge-
neous layers in the entire vitrification range of the TeO₂–WO₃ system have been obtained. The concentration of
metal impurities in the deposited layers does not exceed n 10^–4 wt % that is comparable with their concentra-
tion in the source chlorides. Using the techniques of differential scanning calorimetry and Raman scattering, it
has been shown that, at the melting stage, the layers obtained are vitreous and comparable in their characteris-
tics with the glasses fabricated using traditional techniques.

Keywords: chemical vapor phase deposition, plasma, tungsten–tellurite glass, plasma chemical oxidation

DOI: 10.1134/S1087659612030108

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