Preparation of Nanocrystalline Titanium Carbonitride Coatings
Using Ti(N(Et)₂)₄

N. I. Fainer^a,*, A. N. Golubenko^b, Yu. M. Rumyantsev^a, V. G. Kesler^c,
E. A. Maksimovskii^a, and F. A. Kuznetsov^a

^aNikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences,
pr. Akademika Lavrent’eva 3, Novosibirsk, 630090 Russia

*e-mail: nadezhda@nii.nsc.ru

^bNovosibirsk State University, ul. Pirogova 2, Novosibirsk, 630090 Russia

^cRzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences,
pr. Akademika Lavrent’eva 13, Novosibirsk, 630090 Russia

Received April 16, 2010

Abstract—Titanium carbonitride films with a thickness of 80–150 nm have been synthesized by low pressure
chemical vapor deposition from a gas mixture of tetrakis(diethylamino)titanium and ammonia at temperatures of
773–973 K. The film properties have been studied by spectroscopy (IR, XPS, and EDS), scanning electron and
atomic force microscopy, and ellipsometry. The studies have shown that the films consist of polycrystals with a
size of 15–80 nm; their structure contains chemical bonds of titanium with atoms of carbon, nitrogen, and oxygen.
The film composition is consistent with the data of the previously performed thermodynamic modeling of the dep-
osition of different condensed phases in the Ti–C–N–H–O system. As the deposition temperature increases in the
range under study, the refractive index of the films increases from 2.1 to 2.7.

Keywords: chemical vapor deposition; titanium carbonitride films; IR, XPS, and EDS research methods; chem-
ical and phase compositions of films

DOI: 10.1134/S1087659611030023

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