Optimization of the Composition of a Thermally Resistant Dielectric Organosilicate Coating Based on Ladder Polymer Polyphenylsilsesquioxane

V. I. Voshchikova, *, Ya. A. Khamidulina, L. N. Krasilnikovaa, T. V. Khamovaa, S. N. Stepinb, G. S. Sokolova, A. G. Ivanovaa, and O. A. Shilovaa, c, **

aKonstantinov St. Petersburg Institute of Nuclear Physics–Grebenshchikov Institute of Silicate Chemistry, National Research Centre “Kurchatov Institute,”, St. Petersburg, 199034 Russia

bKazan National Research Technological University, Kazan, 420015 Russia

cSt. Petersburg State Electrotechnical University “LETI”, St. Petersburg, 197022 Russia

email: *voshikoff@yandex.ru
email: **olgashilova@bk.ru

Received 19 February, 2025

Abstract— This article presents the results of a study on protective, dielectric, and thermally resistant organosilicate coatings (OSCs) based on a ladder polymer, polyphenylsilsesquioxane (PPSQ), which is used as a film-forming agent. For the first time, a classical approach is employed to calculate the formulations of pigmented coatings in relation to organosilicate compositions (OSComps). The average viscosity molecular weight of the selected film-forming agent PPSQ is determined. The developed coatings exhibit high thermal resistance up to 420°C while maintaining the necessary physicomechanical and electrophysical properties.

Keywords: organosilicate compositions, protective coatings, viscosimetry, thermal resistance, physicomechanical properties, electrophysical properties

DOI: 10.1134/S1087659625600164