Interaction between Components in the KFframe0SiO2 System

V. G. Konakov and M. M. Pivovarov

Grebenshchikov Institute of Silicate Chemistry, Russian Academy of Sciences,
ul. Odoevskogo 24/2, St. Petersburg, 199155 Russia

Received February 12, 2002

Abstract—A complex investigation of SiO2–KF melts and products of their quenching to room temperature is
performed using electrochemical measurements, quantitative X-ray diffraction analysis, and calorimetry. The
structure of components in the SiO2–KF system and the specific features in their interaction are elucidated. It
is revealed that, in the composition region 0–0.33 mol % SiO2, the interaction between the components is nearly
ideal in character. The inference is made that the associates of silica and potassium fluoride can be formed in
this system, and their approximate composition is determined. It is found that the associates are characterized
by low enthalpies of formation. The results of analyzing the liquidus curve indicate a single eutectic and the
absence of stoichiometric compounds in the system under investigation.


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