Interaction of Microwave-activated Oxygen
with a Polished Copper Surface

O. M. Knipovich^†, V. I. Voronina, and N. I. Konyushkina

Faculty of Chemistry, Moscow State University, Moscow, 119899 Russia

Received February 12, 1996

Abstract—The activation of oxygen in microwave discharge is experimentally studied to obtain the concentra-
tion of atomic oxygen in the afterglow zone as a function of the discharge power, pressure in the reactor, and
gas flow rate. Ellipsometric measurements indicate that the thickness of the layer on the surface of polished cop-
per substantially decreases with increasing exposure time due to the action of activated oxygen.

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